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THIN FILM DEPOSITION TECHNIQUE: REVIEW


Abstract

Abstract: Deposition tools may well be observed as the most important key to the advent of devices. Electronic and optical

tools were primarily foundation on sample phases produced with the aid of thin-film deposition. For production of tools

have incessantly required materials of enhanced nature and superiority in crystal structure, needful a fast advancement

in preparation methods. Instrument producers have become successful works to complete necessities in enhanced as well

as inexpensive preparation techniques and for such methods different parameters maintain sample factors. An additional

significant cause for the hasty development of deposition techniques is the enhanced consideration of the chemistry and

physics of samples, exteriors, boundary, as well as structures make viable through extraordinary progress in

characterizations at some stage in the beyond 20 years.

Keywords: Chemical vapor deposition, Physical vapor deposition, Surface coating, Thin film

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